Karlsruhe-Heidelberg Additive Nanomanufacturing Platform
The Karlsruhe-Heidelberg Additive Nanomanufacturing Platform (KHAMP) is an integrative platfrom to accelerate cycled iterations that combine materials and printing method development. It allows researchers in the Cluster to combine their technologies, and to flexibly perform experiments that combine different printing technologies and materials.
It is located between KIT Campus South (LTI), Campus North (IMT, INT) and innovationLab Heidelberg. Please click on the respective instrument to find out more, as well as the contact person and location.
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}| Equipment | PiXDRO LP50 Inkjet Printer | |||
| Max. substrate size | 227 x 327 mm | |||
| Max. substrate thickness | 25 mm | |||
| Substrate temperature control | Heating up to 90 °C | |||
| Stage accuracy | +/- 20 μm | |||
| Stage precision | +/- 5 μm | |||
| Print speed | Up to 500 mm/s | |||
| Ink viscosity | 2 – 20 cP |
Key features
- Compatible with solvent based, aqueous, hotmelt and UV-curable inks
- Vision systems for drop inspection, substrate alignment and print inspection
- Accurate 5-axis motion systems
- Substrate chuck heating
- All industrial components
- UV-LED for pinning while printing
Access/Contact
Qiaoshuang Zhang,
qiaoshuang.zhang@kit.edu,
+49 721 608-47189
Location
KIT Campus South, Light Technology Institute (LTI)
Building 30.34
Engesserstrasse 13
76131 Karlsruhe
| Printing technology | Contact free, direct writing aerosol deposition | |||
| Feature size | <10µm up to >1000µm, interchangeable nozzles | |||
| Stage accuracy (X/Y/Z) | +/- 2 µm | |||
| Wide ink compatibility | Viscosity: 1 – 1000 cP, Nanoparticles: <500nm | |||
| Print speed | Up to >20mm/s | |||
| Direct Curing | High Power UV LEDs & 1W 830nm IR cw-laser |
Key features
- High-speed 2.5D microfabrication on 350mm x 250mm interchangeable heated vacuum platen
- Full 3D microfabrication on 5-Axis coordinated motion stage with a working area of 200mm x 300mm x 200mm
- System and Process Control Software for operation, parameter control and pattern specification
- Low volume & temperature fabrication
- Comparatively large working distance to substrate >2mm
- Multiple deposition layers easily possible
- Integrated alignment function
Access/Contact
Access to the cleanroom of the Light Technology Institute (LTI) is possible after introduction. Special introduction for the Novacentrix required. Introduction to the Optomec Aerosol jet is only possible under restricted conditions and requires several days of training. To gain access, please contact Qiaoshuang Zhang, Robert Huber or Prof. Uli Lemmer.
| Curing technology | Photonic curing tool | |||
| Peak radiant power | 4,9kW/cm² | |||
| Max radiant energy | 46J/cm² | |||
| Curing dimension per pulse | 75mm x 150mm | |||
| Output spectrum | 200-1.500nm | |||
| Pulse length | 25-100.000µs | |||
| Max puls rate | >kHz |
Key features
- Compatibility with any printing method
- Nano- & micro-scale ins possible
- Ultra fast, repeatable curing
- Fully customizable pulse structures
- Significantly better sintering results compared to standard curing procedures
- Sintering under inert atmosphere (e.g. Copper sintering)
- Highly user friendly
Access/Contact
Access to the cleanroom of the Light Technology Institute (LTI) is possible after introduction. Special introduction for the Novacentrix required. Introduction to the Optomec Aerosol jet is only possible under restricted conditions and requires several days of training. To gain access, please contact Qiaoshuang Zhang, Robert Huber or Prof. Uli Lemmer.
| Materials | Al₂O₃, SiO₂, TiO₂ | |||
| Processing Temperature | 50 – 500 °C | |||
| Film Thickness | nanometer regime | |||
| Maximum Sample Dimensions | 100 x 100 x 100 mm³ |
Key features
- Highly uniform and conformal films
- Dense, crack-, defect- and pinhole-free films
- Coating of 3D structures, high-aspect ratios and porous materials
Location and Access
The atomic layer deposition facility is commissioned soon and is located at IMT, Campus North. Contact person: Dr. Judith Hohmann, Judith.hohmann@kit.edu, 0721 608-22141.
| Printing technology | Inkjet printer | |||
| Minimum XY feature size | 1 µm | |||
| Finest XY resolution | 0.1 µm | |||
| Object height | several tenths of µm | |||
| Print speed | several hundreds of mm/s |
Key features
- Micron scale patterns
- Large viscosity range 0.5 cps – 10000 cps
- Large variety of inks (metals, semiconductor, insulator, proteins, bio inks, …)
- Inkjet printed micro bumps
- Femtolitre dropvolumes
Access/Contact
Any scientist who wants to use the printer needs to get a safety briefing for working in the lab, where the printer is located, as well as an introduction to the printer. To receive the safety briefing and introduction, please contact Gabriel Cadilha Marques (gabriel.marques@kit.edu).
Location
The Printer is located at the Institute of Nanotechnology KIT Campus North
Building 640
Herman-von-Helmholtz-Platz 1
76344 Eggenstein-Leopoldshafen
| Printing technology | Inkjet printer | |||
| Stage accuracy | +/- 1 µm | |||
| Print area | 34.5 cm x 37 cm | |||
| Substrate thickness | up to 35mm | |||
| Substrate rotation | +/- 3 degrees with <0,2 µm accuracy | |||
| Temperature control | 0 to 60°C | |||
| Laser processing | >1W ~450 fs pulsed laser with three wavelengths, plus 3 cw-lasers |
Key features
- Automated process, from printing to post processing and annealing
- Different printheads
- Dropwatcher with drop analysis
- UV LED for pinning and IR lamp for curing during or after printing process
- Air humidity control in printing area
- Post processing capabilities using lasers, with additional printing steps possible afterwards
- Automatic nozzle calibration and deactivation of malfunctioning ones
- Available space for custom processing equipment in the machine
- Optical beampath of lasers can be expanded
Access
The printer is located in a cleanroom. Access requires an introduction to the cleanroom, an access card and participation in a monthly general safety introduction. Furthermore it is required to have attended a laser safety introduction within the last year. An introduction to the machine is mandatory. For all inquiries please contact Christian Rainer (Christian.rainer@kit.edu, +49 6221 54 19140).
Location
InnovationLab Heidelberg
79115 Heidelberg
Speyerer Straße 4
