A new study involving 3DMM2O Doctoral Researcher Jan Hobich, Postdoctoral Researchers Florian Feist and Paul Somers, and Principal Investigators Eva Blasco and Christopher Barner-Kowollik presents a dual-wavelength photochemical approach that enables precise spatial and temporal control over polymer network formation. Using two light-sensitive molecules that react only when exposed to both 375 and 430 nm light, the team produced defined microscale structures in a custom dual-laser lithography setup. This study paves the way for next-generation additive manufacturing by demonstrating the potential of wavelength-encoded control to create complex material architectures with exceptional precision.
© Hobich et al., Angew. Chem. Int. Ed. 2025, e202518815, CC BY 4.0